[29p-PA1-1~17] 8. Plasma Electronics

[29p-PA1-6] Silicon cluster volume fraction of silicon thin films prepared by multi-hollow plasma discharge CVD (8.3)

^○Yeonwon Kim¹, Kosuke Hatozaki¹, Yuji Hashimoto¹, Hyunwoong Seo¹, Kunihiro Kamataki¹, Giichiro Uchida¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (kyushu university¹)

Keywords:CVD、silicon cluster、silicon thin film