[29p-PA1-1~17] 8. Plasma Electronics

[29p-PA1-7] Characterization of Fluorinated Amorphous Carbon Films Fabricated by Low-energy Electron Beam Irradiation on c-C₄F₈ Solid Thin Films Condensed at Cryogenic Temper (8.3)

^○Haruka Soga¹, Kenzi Wako¹, Ryuutarou Yamada¹, Xuebing Hu¹, Tetuya Sato¹, Kiyokazu Nakagawa¹ (Univ. of Yamanashi¹)

Keywords:フルオロカーボン、電子線、極低温