Session information

Oral presentation

07. Beam Technology and Nanofabrication » 7.3 Lithography

[17a-A14-1~12] 7.3 Lithography

Wed. Sep 17, 2014 9:00 AM - 12:30 PM A14 (E305)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:00 AM - 9:30 AM

[17a-A14-1] [INVITED]Sub-10 nm Patterning using DSA Lithography

^○Tsukasa Azuma¹, Yuriko Seino¹, Hironobu Sato¹, Yusuke Kasahara¹, Katsutoshi Kobayashi¹, Katsuyoshi Kodera¹, Hideki Kanai¹, Naoko Kihara¹, Yoshiaki Kawamonzen¹, Teruaki Hayakawa² (EUVL Infrastructutre Development Center, Inc.¹, Tokyo Institute of Technology²)

9:30 AM - 9:45 AM

[17a-A14-2] Development characteristics and pattern profiles of fullerene-incorporated positive tone electron beam resists

^○Shingo Ikeda¹, Yukihiro Higashi¹, Hironori Asada¹, Ryoichi Hshino² (Yamaguchi Univ.¹, Gluon Lab²)

9:45 AM - 10:00 AM

△ [17a-A14-3] Exposure Characteristics of Electron Beam Resists Based on Branched PMMA

^○Shingo Ikeda¹, Yukiko Kishimura¹, Hironori Asada¹, Katsuya Okubo², Kanji Shiraishi², Masashi Kunitake², Ryoichi Hoshino³ (Yamaguchi Univ.¹, Kumamoto Univ.², Gluon Lab³)

10:00 AM - 10:15 AM

[17a-A14-4] Study on Resist Performance of Chemically Amplified Molecular Resists based on Cyclic Oligomer

^○Hiroki Yamamoto¹, Hiroto Kudo², Takahiro Kozawa¹ (ISIR, Osaka Univ.¹, Kansai Univ.²)

10:15 AM - 10:30 AM

△ [17a-A14-5] Fubrication of hp 10 nm absorber pattern on transmission grating for EUV interference lithography

^○Tsubasa Fukui¹, Hirohito Tanino¹, Yuuki Fukuda¹, Tetsuo Harada¹, Takeo Watanabe¹, Hiroo Kinosita¹ (Univ.of Hyogo¹)

10:30 AM - 10:45 AM

△ [17a-A14-6] Development of Large Reflectometer for EUV Collector Mirrors

^○hiraku Hashimoto¹, Haruki Iguchi¹, Youhei Takahashi¹, Masaki Kuki¹, Yusuke Tanaka¹, Takahiro Fujino¹, Tetsuo Harada¹, Takeo Watanabe¹, Hiroo Kinoshita¹ (University of Hyogo¹)

Break 10:45～11:00 (10:45 AM - 11:00 AM)

11:00 AM - 11:15 AM

△ [17a-A14-7] Readability of Two Dimensional Code Marks Printed Using Matrix Arrays of Light Emitting Diodes and Squared Optical Fibers

^○Jun Watanabe¹, Kazuhide Kato¹, Junya Iwasaki¹, Toshiyuki Horiuchi¹ (Tokyo Denki Univ.¹)

11:15 AM - 11:30 AM

△ [17a-A14-8] Development of Simple projection Exposure System and Fabrication of Flow Path Patterns with Vertical Sidewalls

^○Yuhta Morizane¹, Syunsuke Uchino², Yuhsuke Watanabe², Toshiyuki Horiuchi^1,2 (Tokyo Denki Univ¹, Tokyo Denki Univ²)

11:30 AM - 11:45 AM

△ [17a-A14-9] Subjects for Improving Resolution and Homogeneity of Patterns Printed by Scan Projection Exposure Using a Gradient-Index Lens Array

^○Takanori Sato¹, Jun Irisawa², Toshiyuki Horiuti^1,2 (Tokyo Denki Univ¹, Tokyo Denki Univ²)

11:45 AM - 12:00 PM

[17a-A14-10] Non-destructive Inspection of Groove Patterns Etched on Inner Surfaces of Fine Pipes

^○Nozomi Kimura¹, Toshiyuki Horiuchi¹ (Tokyo Denki Univ.¹)

12:00 PM - 12:15 PM

[17a-A14-11] Homogenization of material composition on the ultra-long overhang nanostructure fabrication by focused-ion-beam chemical vapor deposition

^○Reo Kometani¹, Tadashi Aonuma¹ (The Univ. of Tokyo¹)

12:15 PM - 12:30 PM

[17a-A14-12] Improvement of Positioning Accuracy in Three-Dimensional Electron Beam Writing

^○Kenji Yamazaki¹, Hiroshi Yamaguchi¹ (NTT Basic Research Labs.¹)

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