Session information

Poster presentation

08. Plasma Electronics » 8.4 Plasma etching

[18p-PB6] 8.4 Plasma etching

Thu. Sep 18, 2014 1:30 PM - 3:30 PM PB6 (Gymnasium2)

ポスター掲示時間13:30～15:30(PB6会場)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

1:30 PM - 3:30 PM

[18p-PB6-1] Damage Characteristics of AlGaN Surface Etched by CF4 and Ar Plasmas

^○Masahito Niibe¹, Retsuo Kawakami², Yoshitaka Nakano³, Takashi Mukai⁴, Tatsuo Shirahama², Shodai Hirai¹ (Univ. of Hyogo¹, Univ. of Tokushima², Chubu Univ.³, Nichia Corp.⁴)

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