The 75th JSAP Autumn Meeting, 2014

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Oral presentation

07. Beam Technology and Nanofabrication » 7.3 Lithography

[17a-A14-1~12] 7.3 Lithography

Wed. Sep 17, 2014 9:00 AM - 12:30 PM A14 (E305)

9:00 AM - 9:30 AM

[17a-A14-1] [INVITED]Sub-10 nm Patterning using DSA Lithography

○Tsukasa Azuma1, Yuriko Seino1, Hironobu Sato1, Yusuke Kasahara1, Katsutoshi Kobayashi1, Katsuyoshi Kodera1, Hideki Kanai1, Naoko Kihara1, Yoshiaki Kawamonzen1, Teruaki Hayakawa2 (EUVL Infrastructutre Development Center, Inc.1, Tokyo Institute of Technology2)

Keywords:DSA,リソグラフィ,サブ10 nm