The 75th JSAP Autumn Meeting, 2014

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Oral presentation

07. Beam Technology and Nanofabrication » 7.3 Lithography

[17a-A14-1~12] 7.3 Lithography

Wed. Sep 17, 2014 9:00 AM - 12:30 PM A14 (E305)

9:45 AM - 10:00 AM

△ [17a-A14-3] Exposure Characteristics of Electron Beam Resists Based on Branched PMMA

○Shingo Ikeda1, Yukiko Kishimura1, Hironori Asada1, Katsuya Okubo2, Kanji Shiraishi2, Masashi Kunitake2, Ryoichi Hoshino3 (Yamaguchi Univ.1, Kumamoto Univ.2, Gluon Lab3)

Keywords:電子線レジスト,PMMA,分岐