Fubrication of hp 10 nm absorber pattern on transmission grating for EUV interference lithography

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.3 Lithography

Wed. Sep 17, 2014 9:00 AM - 12:30 PM A14 (E305)

10:15 AM - 10:30 AM

^○Tsubasa Fukui¹, Hirohito Tanino¹, Yuuki Fukuda¹, Tetsuo Harada¹, Takeo Watanabe¹, Hiroo Kinosita¹ (Univ.of Hyogo¹)

Keywords:干渉露光用透過型回折格子の製作