[17a-A6-1~9] 6.5 Surface physics and vacuum

[17a-A6-3] In-situ stress observation of Si(111)7×7 reconstruction during Ge/Si heteroepitaxial growth

^○Yuki Uozumi^1,2, Tatsuya Yamazaki³, Hidehito Asaoka¹ (JAEA¹, Hitachi Power Solutions², Eiko Enjineering³)

Keywords:表面再構成,シリコン,水素終端