[17a-S10-1~11] 8. Plasma Electronics English session

▼ [17a-S10-4] Absolute O Atom Density Measured in N₂/O₂ Surface-wave Plasma Using a VUVAS Method with a Calibration of Self-absorption of Light Source

^〇(D)Yang Xiaoli¹, Tei Reitou², Sasaki Koichi³, Nagatsu Masaaki^1,2 (GSST, Shizuoka Univ.¹, Graduate School of Engineering, Shizuoka Uni.², Division of Quantum Science and Engineering, Hokkaido Univ.³)

Keywords: Absolute Atom Density,Self-absorption,VUVAS