[17a-S10-1~11] 8. Plasma Electronics English session

▼ [17a-S10-6] Effects of Annealing on Crystallographic Properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition

^○Lingyun Jia¹, Da Xu¹, Masayuki Nakamura¹, Hirotsugu Sugiura¹, Hiroki Kondo², Kenji Ishikawa², Makoto Sekine², Makoto Sekine² (Nagoya University¹, PLASMA NANOTECHNOLOGY RESEARCH CENTER, NAGOYA UNIVERSITY²)

Keywords:amorphous carbon film