[17a-S10-1~11] 8. Plasma Electronics English session

▲ [17a-S10-8] A Metallic Complex Reaction Etching of Transition Metal by Low-temperature and Damage-free Neutral Beam Process (II)

^○XUN GU¹, Yoshiyuki Kikuchi^1,2, Toshihisa Nozawa¹, Seiji Samukawa² (Tokyo Electron Limited¹, Tohoku Univ.²)

Keywords:中性粒子ビームエッチング,金属錯体化反応