[17p-PA1-1~16] 13.3 Si Process・Interconnect・MEMS・Integration

[17p-PA1-14] Dependence of Ni Silicidation Rate on Si Crystal Structure by Molecular Dynamics

^○Shuichiro Hashimoto¹, Hiroki Kosugiyama¹, Jing Sun¹, Kohei Takei¹, Tetsu Kitani¹, Tomofumi Zushi¹, Takanobu Watanabe¹ (Waseda Univ.¹)

Keywords:ニッケルシリサイド,分子動力学法