The 75th JSAP Autumn Meeting, 2014

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Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[18a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration

Thu. Sep 18, 2014 9:00 AM - 12:30 PM A19 (E311)

9:00 AM - 9:15 AM

[18a-A19-1] Boron activation in B10H14 implanted silicon by soft x-ray irradiation

○Akira Heya1, Shota Hirano1, Fumito Kusakabe1, Naoto Matsuo1, Kazuhiro Kanda2 (Univ. of Hyogo1, LASTI, Univ. of Hyogo2)

Keywords:Bクラスタ,活性化,軟X線