Evaluation of arsenic source shutter performance on MBE

Presentation information

Oral presentation

15. Crystal Engineering » 15.3 III-V-group epitaxial crystals

Thu. Sep 18, 2014 9:00 AM - 12:00 PM A20 (E312)

10:15 AM - 10:30 AM

^○Takeo Kageyama¹, Katuyuki Watanabe², Masahiro Kakuda¹, Satoshi Iwamoto^1,2, Yasuhiko Arakawa^1,2 (NanoQuine, Univ. of Tokyo¹, IIS, Univ. of Tokyo²)

Keywords:MBE,GaAsP,shutter