4:45 PM - 5:00 PM
[18p-A16-13] Formation and Electrical Characteristics of MoS2 Film by High-Temperature Sputtering
Keywords:MoS2,二次元材料,高温スパッタリング
Oral presentation
13. Semiconductors A (Silicon) » 13.4 Devices/Integration Technologies
Thu. Sep 18, 2014 1:30 PM - 5:15 PM A16 (E307)
4:45 PM - 5:00 PM
Keywords:MoS2,二次元材料,高温スパッタリング