Electrical Characterization of Dielectric Breakdown of h-BN

Presentation information

Symposium

Symposium » Present and Future of Functional atomic thin film research

Thu. Sep 18, 2014 1:15 PM - 6:30 PM B3 (Hall)

6:00 PM - 6:15 PM

^○Yoshiaki Hattori¹, Takashi Taniguchi², Kenji Watanabe², Kosuke Nagashio¹ (Tokyo Univ.¹, NIMS²)

Keywords:h-BN,絶縁破壊,AFM