[18p-C1-1~10] 3.12 Nanoscale optical science and near-field optics

[18p-C1-9] Evaluation of polarization and structure dependence of dressed photon etching

^○Toshiki Tsuboi¹, Takashi Yatsui^1,2, Itsuki Banno³, Katsuyuki Nobusada⁴, Fabrice Stehlin⁵, Olivier Soppera⁵, Tadashi Kawazoe¹, Daniel Bloch⁶, Satoshi Tojo⁷, Motoichi Ohtsu¹ (Univ. Tokyo¹, JST/ALCA², Univ. Yamanashi³, IMS⁴, IS2M/ CNRS UMR⁵, LPL CNRS-Paris 13 Univ.⁶, Chuo Univ.⁷)

Keywords:Dressed Photon,表面平滑化,エッチング