[18p-PA1-1~18] 3.2 Materials and equipment optics

[18p-PA1-15] Development of ultra-low reflectance optical absorber using etched ion tracks II

^○Kuniaki Amemiya¹, Hiroshi Koshikawa², Yasunari Maekawa², Takayuki Numata¹, Kenichi Kinoshita¹, Hiroshi Shitomi¹, Minoru Tanabe¹, Daiji Fukuda¹ (AIST¹, JAEA²)

Keywords:光吸収体,イオンビーム加工