The 75th JSAP Autumn Meeting, 2014

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Poster presentation

06. Thin Films and Surfaces » 6.3 Oxide-based electronics

[18p-PA7-1~16] 6.3 Oxide-based electronics

Thu. Sep 18, 2014 4:00 PM - 6:00 PM PA7 (Gymnasium1)

ポスター掲示時間16:00～18:00(PA7会場)

4:00 PM - 6:00 PM

[18p-PA7-6] The Formation of WO3 and Its Application to Resistive Random Access Memory

○(M1)Shota Takagi1, Noritaka Ikeda1, Tetsuji Arai1, Keisuke Arimoto1, Junji Yamanaka1, Kiyokazu Nakagawa1, Toshiyuki Takamatsu2 (Yamanashi Univ.1, SST Inc.2)

Keywords:抵抗変化メモリ,三酸化タングステン,ReRAM