[18p-PB3] 7.3 Lithography

[18p-PB3-1] Computational study on 3-dimensonal exposure by Built-in lens mask lithography

^○Naoki Ueda¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref Univ¹)

Keywords:露光,複素振幅,マスク