[18p-PB7-1~4] 8.5 Plasma nanotechnology

△ [18p-PB7-4] Influences of Substrate Temperature on Crystallinity and Microstructure of Glancing-angle Deposited Tin-nitride Thin Films

^○Fuminori Watanabe¹, Masataka Kato¹, Masahiro Nakao¹, Takashige Masukawa², Yasushi Inoue¹, Osamu Takai³ (Chiba Inst. Technol.¹, Chiba Inst. Technol.², Kanto Gakuin Univ.³)

Keywords:斜め堆積法,スパッタリング,離散的柱状構造