[18p-S1-1~9] Computer Simulations for Plasma Processing (state-of-the-art plasma modelling)

[18p-S1-8] Modeling of Plasma Etching and Its Application to Semiconductor Process Control

^○Nobuyuki Kuboi¹, Masanaga Fukasawa¹, Tetsuya Tatsumi¹ (SONY¹)

Keywords:エッチング,モデリング,制御