[19a-A17-1~12] 13.2 Insulator technology

△ [19a-A17-11] CO₂ Laser Annealing of Polysilazane Coated Film for Polycrystalline Silicon Thin Film Transistors.

^○Daisuke Hishitani¹, Masahiro Horita^1,2, Yasuaki Ishikawa^1,2, Yosuke Watanabe³, Hiroshi Ikenoue³, Yukiharu Uraoka^1,2 (NAIST¹, CREST², Kyushu univ.³)

Keywords:CO2レーザー,ポリシラザン,トランジスタ