The 75th JSAP Autumn Meeting, 2014

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration

Fri. Sep 19, 2014 9:00 AM - 12:30 PM A19 (E311)

12:15 PM - 12:30 PM

[19a-A19-13] Silicidation-induced Rupturing of Si Nanowire with Oxide Shell

Kohei Takei1, Hiroki Kosugiyama1, Shuichiro Hashimoto1, Jing Sun1, Shuhei Asada1, Taiyu Xu1, Takashi Wakamizu1, Takashi Matsukawa2, Meishoku Masahara2, Takanobu Watanabe1 (Waseda Univ.1, AIST2)

Keywords:Si,silicide,nanowire