9:15 AM - 9:30 AM
[19a-A19-2] Vapor phase and surface reaction in SiHCl3-SiHx system
Keywords:化学気相堆積法
Oral presentation
13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration
Fri. Sep 19, 2014 9:00 AM - 12:30 PM A19 (E311)
9:15 AM - 9:30 AM
Keywords:化学気相堆積法