[19a-PA1-1~2] 1.3 Novel Technologies and Frontier Engineering Science

[19a-PA1-2] Etching characterization of Janus-type Triptycene (TripC₁₂) in Cl₂ based inductively coupled plasma etching process

^○Akihiro Matsutani¹, Fumitaka Ishiwari², Yoshiaki Shoji², Takuya Uehara³, Masaru Nakagawa³, Takanori Fukushima^2,4 (Semiconductor and MEMS Processing Center, Tokyo Tech¹, Chem. Res. Lab., Tokyo Tech², IMRAM, Tohoku Univ.³, JST-ERATO⁴)

Keywords:プラズマ,エッチング