[19a-PB4-1~9] 14.1 Physical properties of exploratory materials

[19a-PB4-8] Fabrication of highly oriented Er₂O₃ thin films by ion beam sputter deposition method

^○Masaya Fujita^1,2, Kenji Yamaguchi², Hidehito Asaoka², Wei Mao³, Takumi Chikada⁴, Akihiro Suzuki³, Takayuki Terai³ (Ibaraki Univ.¹, Japan Atomic Energy Agency², Tokyo Univ.³, Shizuoka Univ.⁴)

Keywords:sputter etching,ion irradiation,thin film