[19a-PB5-1~17] 15.6 IV-group-based compounds

[19a-PB5-14] Effects of UV and Ozone Radical Treatments on 4H-SiC Thermal Oxide Film

^○Tadashi Sato¹, Shin-Ichiro Kuroki¹, Seiji Ishikawa², Tomonori Maeda², Hiroshi Sezaki², Takamaro Kikkawa¹ (RNBS, Hiroshima Univ.¹, Phenitec Semicon²)

Keywords:4H-SiC,オゾン