Development of compact ECR ion source with all permanent magnet for various ion productions II

Presentation information

Oral presentation

08. Plasma Electronics » 8.1 Plasma production and control

Fri. Sep 19, 2014 9:00 AM - 12:00 PM S8 (S8)

9:15 AM - 9:30 AM

^○Masayuki Muramatsu¹, Kosuke Oshima², Nobuaki Takahashi³, Satoru Hojo¹, Atsushi Kitagawa¹ (NIRS¹, Toyo Univ.², SHI³)

Keywords:ECRイオン源