Plasma Potential Measurement on ECRIS by Using Extracted Ion Beam

Presentation information

Oral presentation

08. Plasma Electronics » 8.1 Plasma production and control

Fri. Sep 19, 2014 9:00 AM - 12:00 PM S8 (S8)

9:45 AM - 10:00 AM

^○Sho Kumakura¹, Youta Imai¹, Tomoki Nagaya¹, Takuya Nishiokada¹, Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (Osaka Univ.¹)

Keywords:ECR plasma,shallow junction