The 75th JSAP Autumn Meeting, 2014

Presentation information

Print

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19p-A19-1~15] 13.3 Si Process・Interconnect・MEMS・Integration

Fri. Sep 19, 2014 2:00 PM - 6:00 PM A19 (E311)

2:00 PM - 2:15 PM

[19p-A19-1] Fabrication of low resistivity CVD-TiN thin film using new Ti precursor

Kazuhiro Harada1, Kimihiko Nakatani1, ○Hiroshi Ashihara1, Kenji Kanayama1 (Hitachi Kokusai Electric Inc.1)

Keywords:CVD TiN