The 75th JSAP Autumn Meeting, 2014

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19p-A19-1~15] 13.3 Si Process・Interconnect・MEMS・Integration

Fri. Sep 19, 2014 2:00 PM - 6:00 PM A19 (E311)

5:45 PM - 6:00 PM

[19p-A19-15] Development of alignment method for ununiform deformed board by reticle free exposure apparatus

Mitsunori Tone1, Satoshi Yokoyama1, Hiroshi Kubota1, Masao Yoshioka2 (GSST Kumamoto Univ.1, Kumamoto Univ.2)

Keywords:レチクルフリー,アライメント,FPC