Passivation Quallity of AlO<sub>x</sub> Films Deposited by Mist CVD Method

Koji Iguchi

Presentation information

Oral presentation

16. Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[19p-A25-1~16] 16.3 Bulk, thin-film and other silicon-based solar cells

Fri. Sep 19, 2014 1:45 PM - 6:00 PM A25 (E318)

4:45 PM - 5:00 PM

[19p-A25-12] Passivation Quallity of AlO_x Films Deposited by Mist CVD Method

^○Koji Iguchi^1,3, Sho Kitano¹, Shohei Miki¹, Atsushi Ogura^2,3, Haruhiko Yoshida^1,3, Shin-ichi Satoh^1,3, Koji Arafune^1,3 (Univ. of Hyogo¹, Meiji Univ.², JST-CREST³)

Keywords:AlOx

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Presentation information

[19p-A25-1~16] 16.3 Bulk, thin-film and other silicon-based solar cells

[19p-A25-12] Passivation Quallity of AlOx Films Deposited by Mist CVD Method

[19p-A25-12] Passivation Quallity of AlO_x Films Deposited by Mist CVD Method