[19p-PB2-1~19] 14.3 Electron devices and Process technology

[19p-PB2-8] Chemical Vapor Deposition of Silicon-based Insulator Films Enhanced by Surface-Wave Plasma and Application to Nitride Devices

^○Hiroshi Okada^1,2, Kyohei Kawakami², Takahiro Ishimaru², Masatoshi Shinohara², Masakazu Furukawa³, Akihiro Wakahara^2,1, Hiroto Sekiguchi² (EIIRIS¹, Toyohashi Tech², Aries Research Group³)

Keywords:窒化物半導体,表面パッシベーション,化学気相堆積