Analyses of chemical effects of CH+ and CH3+ on etching processes of transparent conducting films

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Fri. Sep 19, 2014 2:15 PM - 7:00 PM S10 (S10)

5:30 PM - 5:45 PM

^○Hu Li¹, Kazuhiro Karahashi¹, Masanaga Fukasawa², Kazunori Nagahata², Tetsuya Tatsumi², Satoshi Hamaguchi¹ (Osaka Univ.¹, Sony Corporation²)

Keywords:Etching,ITO,ZnO