The 75th JSAP Autumn Meeting, 2014

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Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-S10-1~18] 8.4 Plasma etching

Fri. Sep 19, 2014 2:15 PM - 7:00 PM S10 (S10)

2:45 PM - 3:00 PM

△ [19p-S10-3] Etching Characteristic of Magnetic VHF Plasma for High Aspect Ratio Silicon-etch

○Taku Iwase1, Kenetsu Yokogawa1, Takao Arase1, Akira Hirata1, Masahito Mori1 (Hitachi High-tech. Corp.1)

Keywords:HAR,etching,Si