[19p-S8-1~5] 8.1 Plasma production and control

[19p-S8-3] Effect of applying negative DC bias voltage to cathode for RF magnetron sputter (2)

^○Kohei Osuga¹, Haruo Shindo¹, Masao Isomura^1,2 (Tokai Univ. Graduate School of Engineering¹, Tokai Univ. School of Engineering²)

Keywords:プラズマ,スパッタ,DCバイアス