[20a-A19-1~12] 13.3 Si Process・Interconnect・MEMS・Integration

[20a-A19-10] The depositional performance of the Al thin film in Minimal Sputtering System (Ⅱ)

^○Katou Akihiko^1,3, Hisato Ogiso^1,2, Shizuka Nakano^1,2, Yuuki Yabuta³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (MINIMAL¹, AIST², Seinan³)

Keywords:ミニマルファブ