[20a-A19-1~12] 13.3 Si Process・Interconnect・MEMS・Integration

[20a-A19-2] Effect of spin development using a chemical solution of the minimum required

^○Shuuji Okuda¹, Sho Takeuchi^1,2, Yoshihisa Sensu^1,2, Khumpuang Sommawan^1,3, Hara Shiro^1,3 (MINIMAL¹, LTJ², AIST³)

Keywords:現像,ミニマル,表面張力