[20a-PA3-1~7] 13.2 Insulator technology

[20a-PA3-5] Identification of electrical breakdown spots of polycrystalline HfO2 films

^○Yusuke Tomura¹, Ryu Hasunuma¹, Kikuo Yamabe¹, Shinji Migita² (Univ. of Tsukuba¹, AIST NRI²)

Keywords:high-k膜