The 75th JSAP Autumn Meeting, 2014

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Oral presentation

08. Plasma Electronics » 8.5 Plasma nanotechnology

[20a-S9-1~11] 8.5 Plasma nanotechnology

Sat. Sep 20, 2014 9:00 AM - 12:00 PM S9 (S9)

11:00 AM - 11:15 AM

[20a-S9-8] Nitriding reaction of the Si utilizing the RF6kW Compact Thermal Plasma System

○Nari Tsutagawa1, Keiichi Misawa1, Yoshitoki Iijima1, Hisashi Komaki1 (JEOL Ltd.1)

Keywords:熱プラズマ,窒化