[20p-A10-1~8] 6.3 Oxide-based electronics

[20p-A10-5] Redox processes at Cu(Ag)/Ta₂O₅ interfaces and the impact of density of a Ta₂O₅ film on the forming process

^○Tohru Tsuruoka^1,2, Ilia Valov^3,4, Tsuyoshi Hasegawa^1,2, Rainer Waser^3,4, Masakazu Aono¹ (NIMS¹, JST-CREST², RWTH-Aachen³, FZ-Juelich⁴)

Keywords:原子スイッチ,酸化物,酸化還元過程