[19p-E5-1~21] 12.1 Fabrications and Structure Controls

[19p-E5-15] OLED characteristics of co-deposited emission layer formed by gas flow deposition system with fast deposition rate

^○Kohei Tsugita^{1, 5}, Tomohiko Edura^{1, 5}, Satoshi Yukiwaki⁴, Chihaya Adachi^{1, 2, 3, 4} (OPERA Kyushu Univ.¹, WPI-I2CNER Kyushu Univ.², ISIT³, i3-OPERA⁴, Tokyo Electron⁵)

Keywords:ガスフロー蒸着,有機EL,高速成膜