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Symposium

Symposium » Dielectric Thin Film Technology Beyond Borders: From Si to Non-Si

[14p-4C-1~6] Dielectric Thin Film Technology Beyond Borders: From Si to Non-Si

Mon. Sep 14, 2015 1:30 PM - 4:45 PM 4C (432)

座長:小山正人(東芝),渡邉孝信(早大)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

1:30 PM - 2:00 PM

〇Kenji Shiraishi¹ (1.Nagoya Univ.)

2:00 PM - 2:30 PM

〇Tatsuro Maeda¹, Tetsuji Yasuda¹ (1.AIST)

2:30 PM - 3:00 PM

〇Akira Toriumi¹ (1.Univ. Tokyo)

Break (3:00 PM - 3:15 PM)

3:15 PM - 3:45 PM

〇Tsunenobu Kimoto¹ (1.Kyoto Univ.)

3:45 PM - 4:15 PM

〇Heiji Watanabe¹, Takuji Hosoi¹ (1.Osaka Univ.)

4:15 PM - 4:45 PM

〇Tamotsu Hashizume¹ (1.Hokkaido Univ.)

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