[14p-PB11-1~6] 7.6 Ion beams

Mon. Sep 14, 2015 6:30 PM - 8:30 PM PB11 (Shirotori Hall)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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6:30 PM - 8:30 PM

[14p-PB11-1] Evaluation of dopant ion distribution implanted through nanohole mask using 3D atom probe
- Enhancing the aiming precision of single-ion implantation-

〇(M1)Maasa YANO¹, Yuki CHIBA¹, Yasuo SHIMIZU², Koji INOUE², Yasuyoshi NAGAI², Takashi TANII¹, Takahiro SHINADA³ (1.Waseda Univ., 2.IMR Tohoku Univ., 3.CIES Tohoku Univ.)

6:30 PM - 8:30 PM

[14p-PB11-2] XPS analysis on damage of Si surface induced by argon gas cluster ion beam irradiation(3)

〇Ako Miisho¹, Shin Takahashi¹, Naoki Hiyoshi¹, Masayuki Inaba¹, Shugo Miyake¹ (1.Kobelco Research Institute, Inc.)

6:30 PM - 8:30 PM

[14p-PB11-3] Secondary Electron Imaging of Multilayer Ceramic Capacitors with applied voltage using Scanning Helium Ion Microscope

〇Chikako Sakai¹, Nobuyuki Ishida¹, Hideki Masuda¹, Yoichiro Ogata², Daisuke Fujita¹ (1.NIMS, 2.TAIYO YUDEN)

6:30 PM - 8:30 PM

▲ [14p-PB11-4] Morphological control of 1D copper nanostructure grown at room temperature and their field emission properties

〇(D)Mohamad Rosmi^1,2, Yazid Yaakob^1,3, Subash Sharma¹, Mohd Zamri Mohd Yusop⁴, Golap Kalita¹, Masaki Tanemura¹ (1.Nagoya Inst. of Tech., 2.Univ. Pend. Sultan Idris, 3.Univ. Putra Malaysia, 4.Univ. Tech. Malaysia)

6:30 PM - 8:30 PM

[14p-PB11-5] Metallic particle formation by ion beam irradiation in liquid

〇(M2)Yota Matsubayashi¹, Tomohiro Kobayashi², Takayuki Terai¹ (1.Univ. of Tokyo, 2.RIKEN)

6:30 PM - 8:30 PM

[14p-PB11-6] Growth of c-axis tilted ScAlN films by oblique angle sputtering deposition

〇(PC)Masashi Suzuki¹, Takahiko Yanagitani¹ (1.Waseda Univ.)

Session information

[14p-PB11-1~6] 7.6 Ion beams

[14p-PB11-1] Evaluation of dopant ion distribution implanted through nanohole mask using 3D atom probe
- Enhancing the aiming precision of single-ion implantation-

[14p-PB11-2] XPS analysis on damage of Si surface induced by argon gas cluster ion beam irradiation(3)

[14p-PB11-3] Secondary Electron Imaging of Multilayer Ceramic Capacitors with applied voltage using Scanning Helium Ion Microscope

▲ [14p-PB11-4] Morphological control of 1D copper nanostructure grown at room temperature and their field emission properties

[14p-PB11-5] Metallic particle formation by ion beam irradiation in liquid

[14p-PB11-6] Growth of c-axis tilted ScAlN films by oblique angle sputtering deposition

Authentication

Session information

[14p-PB11-1~6] 7.6 Ion beams

[14p-PB11-1] Evaluation of dopant ion distribution implanted through nanohole mask using 3D atom probe- Enhancing the aiming precision of single-ion implantation-

[14p-PB11-2] XPS analysis on damage of Si surface induced by argon gas cluster ion beam irradiation(3)

[14p-PB11-3] Secondary Electron Imaging of Multilayer Ceramic Capacitors with applied voltage using Scanning Helium Ion Microscope

▲ [14p-PB11-4] Morphological control of 1D copper nanostructure grown at room temperature and their field emission properties

[14p-PB11-5] Metallic particle formation by ion beam irradiation in liquid

[14p-PB11-6] Growth of c-axis tilted ScAlN films by oblique angle sputtering deposition

Authentication

[14p-PB11-1] Evaluation of dopant ion distribution implanted through nanohole mask using 3D atom probe
- Enhancing the aiming precision of single-ion implantation-