[15a-4E-1~7] 7.1 X-ray technologies

Tue. Sep 15, 2015 10:00 AM - 11:45 AM 4E (437)

座長:東口武史(宇都宮大)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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10:00 AM - 10:15 AM

▲ [15a-4E-1] X-ray phase scanner using Talbot-Lau interferometry for non-destructive testing

〇(P)Shivaji Bachche¹, Masahiro Nonoguchi², Koichi Kato², Masashi Kageyama², Takafumi Koike², Masaru Kuribayashi², Atsushi Momose¹ (1.Tohoku Univ., 2.Rigaku Corp.)

10:15 AM - 10:30 AM

[15a-4E-2] X-ray reflecting demonstration in 12 inch Si wafer optics produced by MEMS Tech.

〇Masaki NUMAZAWA¹, Yuichiro Ezoe¹, Kumi Ishikawa², Tomohiro Ogawa¹, Mayu Sato¹, Kasumi Nakamura¹, Takaya Ohashi¹, Kazuhisa Mitsuda³, Ryutaro Maeda⁴, Hiroshi Hiroshima⁴, Yuichi Kurashima⁴, Daiji Noda⁵ (1.TMU, 2.RIKEN, 3.JAXA / ISAS, 4.AIST, 5.MMC)

10:30 AM - 10:45 AM

[15a-4E-3] Current state of development of X-ray optics system using Silicon dry etching

〇Kasumi Nakamura¹, Yuichiro Ezoe¹, Kumi Ishikawa², Tomohiro Ogawa¹, Mayu Sato¹, Masaki Numazawa¹, Kazuma Takeuchi¹, Masaru Terada¹, Takaya Ohashi¹, Kazuhisa Mitsuda⁴, Yuichi Kurashima³, Hideki Takagi³ (1.TMU, 2.RIKEN, 3.AIST, 4.isas)

10:45 AM - 11:00 AM

[15a-4E-4] The new X-ray two-dimensional detector that has the ability of discrimination of
sub-micron ~ nano size (Part 1)

〇Hiroyoshi Soejima¹, Toshiyuki Kakihara², Toshiharu Ai², Kuniyoshi Mori², Hiroyuki Watanabe² (1.Applied Science Lab., 2.Hamamatsu Photonics)

11:00 AM - 11:15 AM

[15a-4E-5] The New X-ray two-dimensional detector that has the ability of discrimination of
sub-micron ~ nano size (Part 2)

〇Hiroyoshi Soejima¹, Toshiyuki Kakihara², Toshiharu Ai², Kuniyoshi Mori², Hiroyuki Watanabe² (1.Applied Science Lab., 2.Hamamatsu Photonics)

11:15 AM - 11:30 AM

[15a-4E-6] Organelle distribution in SX image by correlation between SX and fluorescence images

〇Takeo Ejima¹, Masataka Kado², Masato Aoyama³, Keiko Yasuda³, Satoshi Tamotsu³ (1.Tohoku Univ., IMRAM, 2.JAEA, 3.Nara Women's Univ.)

11:30 AM - 11:45 AM

[15a-4E-7] Soft X-ray absorption and reflectivity analysis system in BL10 at the NewSUBARU

〇Yasuji Muramatsu¹, Tetsuo Harada², Takeo Watanabe², Hiroo Kinoshita² (1.Univ. Hyogo, 2.LASTI, Univ. Hyogo)

Session information

[15a-4E-1~7] 7.1 X-ray technologies

▲ [15a-4E-1] X-ray phase scanner using Talbot-Lau interferometry for non-destructive testing

[15a-4E-2] X-ray reflecting demonstration in 12 inch Si wafer optics produced by MEMS Tech.

[15a-4E-3] Current state of development of X-ray optics system using Silicon dry etching

[15a-4E-4] The new X-ray two-dimensional detector that has the ability of discrimination of
sub-micron ~ nano size (Part 1)

[15a-4E-5] The New X-ray two-dimensional detector that has the ability of discrimination of
sub-micron ~ nano size (Part 2)

[15a-4E-6] Organelle distribution in SX image by correlation between SX and fluorescence images

[15a-4E-7] Soft X-ray absorption and reflectivity analysis system in BL10 at the NewSUBARU

Authentication

Session information

[15a-4E-1~7] 7.1 X-ray technologies

▲ [15a-4E-1] X-ray phase scanner using Talbot-Lau interferometry for non-destructive testing

[15a-4E-2] X-ray reflecting demonstration in 12 inch Si wafer optics produced by MEMS Tech.

[15a-4E-3] Current state of development of X-ray optics system using Silicon dry etching

[15a-4E-4] The new X-ray two-dimensional detector that has the ability of discrimination ofsub-micron ~ nano size (Part 1)

[15a-4E-5] The New X-ray two-dimensional detector that has the ability of discrimination ofsub-micron ~ nano size (Part 2)

[15a-4E-6] Organelle distribution in SX image by correlation between SX and fluorescence images

[15a-4E-7] Soft X-ray absorption and reflectivity analysis system in BL10 at the NewSUBARU

Authentication

[15a-4E-4] The new X-ray two-dimensional detector that has the ability of discrimination of
sub-micron ~ nano size (Part 1)

[15a-4E-5] The New X-ray two-dimensional detector that has the ability of discrimination of
sub-micron ~ nano size (Part 2)