Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[16a-4E-9~12] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 16, 2015 11:15 AM - 12:15 PM 4E (437)

座長:山本治朗(日立)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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11:15 AM - 11:30 AM

△ [16a-4E-9] Development of Transmission Grating of EUV Interference Lithography for12.5 nm HP EUV Resist Evaluation

〇(M1)Yuki Fukuda¹, Tsubasa Fukui¹, Hirohito Tannino¹, Tetsuo Harada¹, Takeo Watanabe¹ (1.Univ. of Hyogo)

11:30 AM - 11:45 AM

[16a-4E-10] Electron beam lithography using NEB-22 for 50 nm-line and space pattern fabrication

〇Makoto Okada¹, Shinji Matsui¹ (1.LASTI, Univ. of Hyogo)

11:45 AM - 12:00 PM

[16a-4E-11] Exposure Characteristics of New Modacrylic Electron Beam Polymer Resist

〇RYOICHI HOSHINO¹, ATSUSHI KAWATA¹, MASASHI KUNITAKE², SHUNSUKE OCHIAI³, TOMOHIRO TAKAYAMA³, YUKIKO KISHIMURA³, HIRONORI ASADA³ (1.Gluon Lab, 2.Kumamoto Univ., 3.Yamaguchi Univ.)

12:00 PM - 12:15 PM

[16a-4E-12] Rapid Thermally Directed Self-Assembly of Amphiphilic Liquid-Crystalline Diblock Copolymer into Quasi-Long-Range-Ordered 2D Vertical Cylinder Arrays

〇Toru Yamaguchi¹, Motonori Komura³, Keiji Nagai², Akira Fujiwara¹, Hiroshi Yamaguchi¹, Tomokazu Iyoda² (1.NTT BRL, 2.Tokyo Inst. Tech., 3.NIT, Numazu College)

Session information