The 76th JSAP Autumn Meeting, 2015

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13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

[13a-1C-1~10] 13.4 Si wafer processing /MEMS/Integration technology

Sun. Sep 13, 2015 9:00 AM - 11:45 AM 1C (135)

座長:河本 直哉(山口大),松尾 直人(兵庫県立大)

9:00 AM - 9:15 AM

[13a-1C-1] Boron laser doping on Si substrate using doping sheet

Yuka Tomizawa1, Tetsuya Imamura1, 〇YOSHINORI IKEDA1, Takashi Shiro1,2 (1.TEIJIN LIMITED, 2.NanoGram Corporation)

Keywords:Laser doping