Electrical Characteristics of Plasma ALD SiO<sub>2</sub> Films with Nitrogen Incorporation

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Sun. Sep 13, 2015 9:00 AM - 12:15 PM 4C (432)

座長:渡邉孝信(早大),右田真司(産総研)

9:15 AM - 9:30 AM

〇Koudai Endo¹, Yiming Lei¹, Kuniyuki Kakushima¹, Hitoshi Wakabayashi¹, Kazuo Tsutsui¹, Hiroshi Iwai¹ (1.Tokyo Tech.IGSSE)

Keywords:silicon oxynitride