[13p-2C-1~14] 4.1 Plasmonics

▲ [13p-2C-2] Titanium Nitride Thin films as Plasmonic Materials with High power Impulse Magnetron Sputtering

〇(D)Zih-Ying Yang¹, Yi-Hsun Chen¹, Bo-Huei Liao², Kuo-Ping Chen³ (1.Inst. of Lighting and Energy Photonics, National Chiao Tung Univ., 2.Instrument Technology Research Center, National Applied Research Laboratories, 3.Inst. of Imaging and Biomedical Photonics, National Chiao Tung Univ.)

キーワード：Plasmonics,Metamaterials,High-power impulse magnetron sputtering

TiN has low loss in the visible and NIR wavelengths and the optical properties can be adjusted that TiN is expected to serve as the alternative plasmonic material in visible and NIR wavelengths rather than gold and silver. Reactive sputtering deposition is commonly used to deposit nitride films because the composition of the film can be controlled by varying the relative pressures of the inert and reactive gases. In past decades, the development of reactive high power impulse magnetron sputtering (HiPIMS) technology has got lots of attention due to not only better performance of compound deposited films but also more smooth and denser films . In this study, TiN thin films were deposited on B270 glass by HiPIMS with DC/RF cosputtering system at 400 degree. First, the effects of power density parameter on the conductivity and optical resonant properties of the TiN thin film will be investigated. Then, the relationship between electrical and optical properties will be shown.